Nanometrics Nanospec 210

210 Film Measurement System consisting of:

 System Specifications:

 - Range of Thicknesses: 100 to 500,000 angstroms

- Typical Measurement Time: 2.5 seconds.

- Spot Size:

1. 50 um with 5x objective
2. 25 um with 10x objective
3. 6.5 um with 40x objective

- Film Types Measured:

1. Oxide on Silicon
2. Nitride on Silicon
3. Negative Resist on Silicon
4. Polysilicon on Oxide
5. Negative Resist on Oxide
6. Nitride on Oxide
7. Polyimide on Silicon
8. Positive Resist on Silicon
9. Positive Resist on Oxide

- Reflectance Mode: Thick Films

- Reproducibility: 5A ± 5% depending upon the film type